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1 article(s) from Schneider, Nathanaëlle

Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement

Cathy Bugot,
Nathanaëlle Schneider,
Daniel Lincot and
Frédérique Donsanti

Beilstein J. Nanotechnol. 2013, 4, 750–757, doi:10.3762/bjnano.4.85

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Figure 1: Growth rate of pure In₂S₃ a) as function of the process temperature b) as function of the In(acac)₃...

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Figure 2: Influence of the number of In₂O₃ cycles on (a) the growth rate while using H₂O as oxygen precursor ...

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Figure 3: Influence of the ratio of In₂O₃ cycles on the film absorption spectra when using H₂O as oxygen prec...

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Figure 4: Influence of a) the number of In₂O₃ cycles on the growth rate b) the number of process cycles on th...

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Figure 5: Influence of the number of In₂O₃ cycle on the film transmittance when using O₂ plasma as oxygen pre...

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Figure 6: Influence of the number of In₂O₃ cycles a) on the absorption and b) optical band gap when using O₂ ...

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Figure 7: Surface mechanisms during the O₂ plasma pulse.

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Published 13 Nov 2013

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